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5nm chips can be produced without EUV lithography, and semiconductor technology has ushered in a major breakthrough

5nm chips can be produced without EUV lithography, and semiconductor technology has ushered in a major breakthrough

(Summary description)Nowadays, as the semiconductor process technology becomes more and more advanced, the requirements for the mechanical equipment for manufacturing chips are also higher and higher. Therefore, the EUV lithography machine produced by ASML company in the Netherlands has become the key production equipment of semiconductor process technology. However, due to the high cost of EUV lithography machine, the price of each machine exceeds US $100 million, the difficulty of manufacturing EUV lithography machine and the serious shortage of production capacity, major chip production companies are crazy to grab EUV lithography machine, and if there is a lack of lithography machine, the production cost of chip will be greatly increased.
In the face of such severe problems, kioxia, a large Japanese storage company, and canon, a semiconductor equipment factory, and DNP, a semiconductor component manufacturer such as a mask, have jointly developed a new nil process technology, which can advance the semiconductor process technology to 5nm without EUV lithography.
It is reported that Kaixia has mastered the mass production technology of 15nm process. At present, it is making every effort to develop the technology below 15nm. It is expected to further achieve the planned goal in 2025.
Compared with the commercial EUV lithography technology, Kaixia said that the advantage of nil technology is that it can greatly reduce energy consumption and reduce equipment cost. The reason is that the lithography process of nil technology is relatively simple, the power consumption can be reduced to 10% of EUV technology, and the equipment investment can be reduced to only 40% of EUV equipment. At present, only ASML in the Netherlands can produce and supply the high-end EUV lithography machine. It not only has high price, but also needs the cooperation of many testing equipment, and the production is extremely difficult and the production capacity is extremely limited.
However, although nil technology has many advantages, there are still many problems to be solved in mass production at this stage. The big problem is that compared with EUV lithography machine, nil technology is more likely to form defects due to the influence of fine dust in the air.
It is reported that for Kaixia, NAND components are easier to adapt to the nil technology process because they adopt a 3D three-dimensional stacking structure. Kaixia also said that at present, it has successfully solved the basic technical problems of nil and is promoting mass production technology. It is hoped that it can be introduced into NAND production first than other competitors. Once Kaixia successfully takes the lead in introducing nil technology and realizing mass production, it is expected to make up for the adverse situation in the equipment investment competition and meet the needs of reducing carbon emissions.
In addition, according to DNP, the circuit miniaturization degree of nil mass production technology can reach 5nm nodes, and DNP has been conducting internal simulation according to the specification value of the equipment since the spring of 2021. For such technological progress, DNP revealed that many semiconductor manufacturers have begun to ask about nil mass production technology, which means that many manufacturers have high hopes for nil technology.
Canon, another partner, is also committed to widely applying nil mass production technology to the equipment for making logic chips such as CPU for DRAM and PC, so as to supply more semiconductor manufacturers in the future, and hope to be applied to the most advanced processes such as mobile phone application processor in the future.
If nil can be successfully developed in the future, it is definitely good news for the current semiconductor industry. Therefore, the production capacity of semiconductor chips will be greatly improved, which can also greatly alleviate the global core shortage problem.

5nm chips can be produced without EUV lithography, and semiconductor technology has ushered in a major breakthrough

(Summary description)Nowadays, as the semiconductor process technology becomes more and more advanced, the requirements for the mechanical equipment for manufacturing chips are also higher and higher. Therefore, the EUV lithography machine produced by ASML company in the Netherlands has become the key production equipment of semiconductor process technology. However, due to the high cost of EUV lithography machine, the price of each machine exceeds US $100 million, the difficulty of manufacturing EUV lithography machine and the serious shortage of production capacity, major chip production companies are crazy to grab EUV lithography machine, and if there is a lack of lithography machine, the production cost of chip will be greatly increased.
In the face of such severe problems, kioxia, a large Japanese storage company, and canon, a semiconductor equipment factory, and DNP, a semiconductor component manufacturer such as a mask, have jointly developed a new nil process technology, which can advance the semiconductor process technology to 5nm without EUV lithography.
It is reported that Kaixia has mastered the mass production technology of 15nm process. At present, it is making every effort to develop the technology below 15nm. It is expected to further achieve the planned goal in 2025.
Compared with the commercial EUV lithography technology, Kaixia said that the advantage of nil technology is that it can greatly reduce energy consumption and reduce equipment cost. The reason is that the lithography process of nil technology is relatively simple, the power consumption can be reduced to 10% of EUV technology, and the equipment investment can be reduced to only 40% of EUV equipment. At present, only ASML in the Netherlands can produce and supply the high-end EUV lithography machine. It not only has high price, but also needs the cooperation of many testing equipment, and the production is extremely difficult and the production capacity is extremely limited.
However, although nil technology has many advantages, there are still many problems to be solved in mass production at this stage. The big problem is that compared with EUV lithography machine, nil technology is more likely to form defects due to the influence of fine dust in the air.
It is reported that for Kaixia, NAND components are easier to adapt to the nil technology process because they adopt a 3D three-dimensional stacking structure. Kaixia also said that at present, it has successfully solved the basic technical problems of nil and is promoting mass production technology. It is hoped that it can be introduced into NAND production first than other competitors. Once Kaixia successfully takes the lead in introducing nil technology and realizing mass production, it is expected to make up for the adverse situation in the equipment investment competition and meet the needs of reducing carbon emissions.
In addition, according to DNP, the circuit miniaturization degree of nil mass production technology can reach 5nm nodes, and DNP has been conducting internal simulation according to the specification value of the equipment since the spring of 2021. For such technological progress, DNP revealed that many semiconductor manufacturers have begun to ask about nil mass production technology, which means that many manufacturers have high hopes for nil technology.
Canon, another partner, is also committed to widely applying nil mass production technology to the equipment for making logic chips such as CPU for DRAM and PC, so as to supply more semiconductor manufacturers in the future, and hope to be applied to the most advanced processes such as mobile phone application processor in the future.
If nil can be successfully developed in the future, it is definitely good news for the current semiconductor industry. Therefore, the production capacity of semiconductor chips will be greatly improved, which can also greatly alleviate the global core shortage problem.

Information

Nowadays, as the semiconductor process technology becomes more and more advanced, the requirements for the mechanical equipment for manufacturing chips are also higher and higher. Therefore, the EUV lithography machine produced by ASML company in the Netherlands has become the key production equipment of semiconductor process technology. However, due to the high cost of EUV lithography machine, the price of each machine exceeds US $100 million, the difficulty of manufacturing EUV lithography machine and the serious shortage of production capacity, major chip production companies are crazy to grab EUV lithography machine, and if there is a lack of lithography machine, the production cost of chip will be greatly increased.
In the face of such severe problems, kioxia, a large Japanese storage company, and canon, a semiconductor equipment factory, and DNP, a semiconductor component manufacturer such as a mask, have jointly developed a new nil process technology, which can advance the semiconductor process technology to 5nm without EUV lithography.
It is reported that Kaixia has mastered the mass production technology of 15nm process. At present, it is making every effort to develop the technology below 15nm. It is expected to further achieve the planned goal in 2025.
Compared with the commercial EUV lithography technology, Kaixia said that the advantage of nil technology is that it can greatly reduce energy consumption and reduce equipment cost. The reason is that the lithography process of nil technology is relatively simple, the power consumption can be reduced to 10% of EUV technology, and the equipment investment can be reduced to only 40% of EUV equipment. At present, only ASML in the Netherlands can produce and supply the high-end EUV lithography machine. It not only has high price, but also needs the cooperation of many testing equipment, and the production is extremely difficult and the production capacity is extremely limited.
However, although nil technology has many advantages, there are still many problems to be solved in mass production at this stage. The big problem is that compared with EUV lithography machine, nil technology is more likely to form defects due to the influence of fine dust in the air.
It is reported that for Kaixia, NAND components are easier to adapt to the nil technology process because they adopt a 3D three-dimensional stacking structure. Kaixia also said that at present, it has successfully solved the basic technical problems of nil and is promoting mass production technology. It is hoped that it can be introduced into NAND production first than other competitors. Once Kaixia successfully takes the lead in introducing nil technology and realizing mass production, it is expected to make up for the adverse situation in the equipment investment competition and meet the needs of reducing carbon emissions.
In addition, according to DNP, the circuit miniaturization degree of nil mass production technology can reach 5nm nodes, and DNP has been conducting internal simulation according to the specification value of the equipment since the spring of 2021. For such technological progress, DNP revealed that many semiconductor manufacturers have begun to ask about nil mass production technology, which means that many manufacturers have high hopes for nil technology.
Canon, another partner, is also committed to widely applying nil mass production technology to the equipment for making logic chips such as CPU for DRAM and PC, so as to supply more semiconductor manufacturers in the future, and hope to be applied to the most advanced processes such as mobile phone application processor in the future.
If nil can be successfully developed in the future, it is definitely good news for the current semiconductor industry. Therefore, the production capacity of semiconductor chips will be greatly improved, which can also greatly alleviate the global core shortage problem.

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